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Home » Equipment » Atomic Layer Deposition » WCS 500

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WCS 500

Web Coating System WCS 500 for roll-to-roll ALD

For the very first time in ALD history, roll–to–roll has been made viable and accessible for research and industrial production. The WCS 500 offers true roll–to–roll ALD on flexible webs up to 500 mm in width.

The Beneq WCS 500 has been designed as a development platform, which means it can address the different R&D needs of different customers. As an example, the WCS 500 can handle many types of substrate materials and thicknesses. With a coating capacity of 400,000 m2/year, the WCS 500 expands easily from R&D to pilot production for many industrial applications, including moisture barriers for flexible organic electronics and buffer layers for CIGS solar cells.

Performance highlights

  • true roll-to-roll ALD process
  • maximum web width 500 mm
  • non-contacting web handling
  • capacity 400,000 m2/year (for specific application)
     

System main components

  • Vacuum chamber with web reels, processing drum and ALD coating head
  • Beneq Precursor Delivery System (PDS)
  • Electrical and control cabinet
  • Precursor de-activation system
  • Vacuum pump
     

Technical specifications

 Process temperature range  up to 150 ºC
 Substrate size (web width)  up to 500 mm
 Substrate material  polymer film or other flexible
 Web speed  up to 2m/min
 Throughput (for 25 nm film thickness)  400,000 m2 /year
 Control system  PLC control with PC user
 interface
 Main dimensions, ALD system (L × W × H)  2060 × 2340 ×2150 (mm)
 Main dimensions, Precursor Delivery System 
 (L × W × H)
 1750 × 800 × 1530 (mm)
 Main dimensions, electrical cabinet
 (L × W × H)
 1010 × 320 × 1220 (mm)

 

More information

Download WCS 500 brochure (pdf)

Image gallery

WCS 500
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Beneq © 2010, All rights reserved.
  • ALD equipment in general
  • TFS 200
  • TFS 200R
  • TFS 500
  • TFS 600
  • TFS 1200
  • TFS NX300
  • P400A and P800
  • WCS 500