Beneq TFS 200R Atomic Layer Deposition System is designed for research and development of continuous mode and Roll-to-Roll ALD. The system can be used for depositing certain thin films on various flexible substrates. The flexible substrate is fixed on a cylinder. The cylinder is surrounded by a number of nozzles, each creating a certain gas region. As the cylinder is rotated, the substrate passes through different gas regions and gets coated. Dynamic behavior of various precursor chemistries can be easily investigated, to simulate and evaluate maximum line speeds up to 5m/s.

TFS 200R specifications

Deposition modes Temperature range Pressure range Speed range Substrate size

Cycle mode and Time mode - 25 - 200 °C - 1 - 800 mbar - 0 - 300 m/min - 314 * 100 mm