Beneq TFS 200 Atomic Layer Deposition System is designed for research and development purposes. The system can be used for depositing various thin films on various substrates.

The system is Class 100 (ISO 5) clean-room compatible. The precursor source configuration is easily adjustable. The source configuration allows easy, inert change of precursors and it is capable of handling gas, liquid and solid precursors. The system allows easy cleaning and change of all wetted parts in both source system and reaction chamber.

TFS 200 Atomic Layer Deposition System presentation in PDF-format
TFS 200 brochure in PDF-format