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Home » Equipment » Atomic Layer Deposition » TFS NX300

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TFS NX300

Thin Film System TFS NX300 for industrial surface passivation of c-Si solar cells

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline silicon (c-Si) solar cell wafers. The batch size is 500 pcs, enabling an hourly throughput of 3200 wafers.
 

Coating specifications

 Batch size  500 wafers
 Wafer size  156 × 156 (mm)
 Film thickness  20 nm
 Growth rate  0.12 nm/cycle
 Cycle time  4 s
 Coating chambers  4
 Throughput  3900 wafers/h

 

More information

Being an application-specific system, more information related to the TFS NX300 can be found under the application page for Surface passivation for c-Si solar cells.

 

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TFS NX300

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  • ALD equipment in general
  • TFS 200
  • TFS 200R
  • TFS 500
  • TFS 600
  • TFS 1200
  • TFS NX300
  • P400A and P800
  • WCS 500