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Home » Equipment » Atomic Layer Deposition » TFS 1200

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TFS 1200 and TFS 1200B

Thin Film System TFS 1200 for in-line and batch production of buffer layer on CIGS cells

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on copper-indium-gallium-diselenide (CIGS) thin film solar cells. The maximum substrate size is 1200 × 1200 (mm), a recognized world-record in substrate size in ALD.
 

Coating specifications

 Materials  Zn(O,S)
 (Zn,Mg)O      (optional)
 In2S3           (optional)
 Thickness  10 - 50 nm
 Process temperature  120 - 180 °C
 Throughput and productivity
 (for Beneq TFS 1200 in-line coating system)
 panel amount:     5 panels/h (for 50 nm Zn(O,S)
 coating)
 max. panel size:  1200 × 1200 (mm)
 annual capacity:  > 50,000 m²/a (≈ 6.5 MWp/a)
  Throughput and productivity
  Beneq TFS 1200 B off-line batch module
  (6 substrates each)
 panel amount:     45 panels/h (for 50 nm Zn(O,S) 
 coating)
 max. panel size:  1200 x 1600 (mm)
 annual capacity:  >670,000 m²/a (≈ 88 MWp/a)

 

More information

Being an application-specific system, more information related to the TFS 1200 can be found under the application page for Cadmium-free buffer layer for CIGS solar cells.
 

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  • ALD equipment in general
  • TFS 200
  • TFS 200R
  • TFS 500
  • TFS 600
  • TFS 1200
  • TFS NX300
  • P400A and P800
  • WCS 500