P400A and P800 are general platforms for the ALD-deposition for 3D-substrates and for large substrates. The minienvironment concept enables many degrees of freedom. Handling can be automated when volumes justify it or batch size and substrate sizes can vary from run to run. It is possible to use same tool for various processes without cross contamination by using dedicated substrate cans and precursor manifolds.

P400A and P800 reactors allows immediate scale up after the initial R&D. P400A and P800 have 6 sigma tool reliability. This is based on data from 5 years of Al₂O₃ production for about 1 million (TFEL displays). Result of 20+ years of 24/7 mode batch production. Parts are low cost. Precursor sources and loading setups may use some consumables.

P400A/P800 brochure in PDF-format