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Company News: 5 November 2009
Beneq announces the first continuous mode Atomic Layer Deposition (ALD) research tool commercially available, the TFS 200R. It has been designed for process development related to Roll-to-Roll ALD. In TFS 200R, the flexible substrate is fixed on a cylinder. The cylinder is surrounded by a number of nozzles, each creating a certain gas zone. As the cylinder is rotated, the substrate passes through different gas zones and is then coated. This tool is very useful for basic research of the continuous mode ALD process and is a must for all those who are considering using ALD in a high throughput Roll-to-Roll production. Roll-to-Roll ALD has recently acquired a lot of interest, especially as a method to deposit high quality moisture barriers for flexible electronics.
The very first TFS 200R was recently delivered to the Advanced Surface Technology Laboratory (ASTRaL) at Lappeenranta University of Technology (LUT) in Finland, where it serves as a research tool to study nanotechnological coating solutions for the paper industry. Prof. David Cameron, LUT, says "The high level of flexibility in the configuration of this new tool will allow us to explore the processing problems inherent in developing a roll-to-roll process." Sampo Ahonen, CEO of Beneq, continues, "Our new ALD research tool will accelerate the development of high volume production Roll-to-Roll ALD applications for flexible electronics and the paper industry, and this will pave the way for high throughput industrial Roll-to-Roll ALD solutions and equipment."
The goal of the research work at ASTRaL with the new TFS 200R tool is the integration of Atomic Layer Deposition into paper industry applications, in cooperation with the paper and packaging companies Stora-Enso and UPM Raflatac and the coating company Savcor. The work is supported by the EU via TEKES, the Finnish Funding Agency for Technology and Innovation.
For additional information, please contact:
Mr Sampo Ahonen, CEO, Beneq Oy
M: + 358 40 520 1090, 
www.beneq.com
Beneq Oy, based in Vantaa, Finland, is a supplier of industrial equipment and technology for global markets.
Beneq is turning innovations into success by providing nanotechnology enabled functional coating
applications for the cleantech and renewable energy fields, especially in glass, photovoltaics, and emerging thin films markets.
Beneq's solutions are based on Atomic Layer Deposition (ALD) and proprietary atmospheric nHALO® and nAEROTM aerosol coating technologies.
More information on Beneq ALD systems:
TFS 200 - Thermal and plasma ALD system for R&D TFS 200
TFS 200R - ALD system for research of continuous ALD TFS 200R
TFS 500 - Thermal and plasma ALD system for R&D and pilot production TFS 500
P400A - Batch production ALD system P400A/P800
P800 - Large size batch production ALD system P400A/P800
TFS 4x300 - High throughput ALD system for surface passivation of c-Si solar cells Surface Passivation of c-Si Solar Cells
TFS 1200 - In-line ALD system for CIGS solar cell buffer layer and for the display industry Cadmium-free Buffer Layer for CIGS
Read the news in pdf-format
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