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Company News: 19 September 2009
Beneq, a company providing industrial and R&D equipment and technology for functional coatings,
continues its investments in Atomic Layer Deposition (ALD) material development. Beneq presented
recent results of ALD material and new application development at ALD 2009 Conference in Monterey,
California in July.
Dr. Matti Putkonen, Senior Scientist of Beneq and Professor at Helsinki University of Technology had
oral presentations in the Conference. The presentations can be found in the ALD 2009 Conference
proceedings. Presentations subjects were:
M. Putkonen, Beneq Oy "Atomic Layer Deposition of Metal Fluoride Thin Films Through Oxide Chemistry"
M. Putkonen, Beneq Oy, T. Ishiguro, T. Hara, Taiyo Yuden Co "Highly oxygen sensitive SrTiO3 thin films
deposited by ALD"
The results of metal fluoride research further strengthen Beneq´s position in optical applications,
such as nOPTOTM and also in the ALD equipment market for R&D applications.
Beneq´s R&D Engineer, Ville Malinen, presented a poster "Effects of ALD TiN on the abrasion resistance
of three stainless steel grades". Mr. Malinen is application manager of Beneq nBIOCOMPTM.
nBIOCOMPTM technologies brings the benefits of ALD to the medical industry.
Read the poster in PDF-format.
Contact:
Mr Sampo Ahonen, CEO, Beneq Oy
M: + 358 40 520 1090, 
www.beneq.com
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