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PRESS RELEASE: 2 September 2009
Beneq, a company providing industrial and R&D equipment and technology for functional coatings,
has further strengthened its position in the plasma enhanced Atomic Layer Deposition (PEALD)
equipment market, by establishing a collaboration agreement with Dr. Arthur Sherman,
the pioneer and key inventor of PEALD technology.
Dr. Sherman noted that "PEALD technology provides important additional capabilities in
expanding ALD process and chemistry options, e.g. for lower process temperatures and
for new coating materials, not currently available using traditional thermal ALD."
Dr. Tommi Vainio, CTO of Beneq, added that "This collaboration agreement with Dr. Sherman
further accelerates Beneq's expansion in the PEALD applications, including not only our current
popular R&D ALD systems, TFS 200 and TFS 500, but also future industrial production ALD systems
utilizing PEALD capabilities. Beneq's customers have now access to strong PEALD process support,
in addition to the advanced and proven ALD systems from Beneq."
Related to this collaboration, Dr. Sherman provided the keynote presentation during Beneq's
ALD customer meeting on September 2, 2009.
For additional information please contact:
Mr Sampo Ahonen, CEO, Beneq Oy
M: + 358 40 520 1090, sampo.ahonen@beneq.com , www.beneq.com
Beneq Oy, Vantaa, Finland, is a supplier of industrial equipment and technology for global markets.
Beneq is turning innovations into success by providing nanotechnology enabled functional coating
applications for cleantech and renewable energy areas especially in glass, photovoltaics and emerging
thin films markets. Beneq solutions are based on Atomic Layer Deposition (ALD) and proprietary atmospheric
nHALO® & nAEROTM
aerosol coating technologies.
Press release in pdf-format
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