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09 October 2008
Beneq's New Thin Film System TFS 200 Advances Atomic Layer Deposition Research and Development

18 June 2008
Beneq Moscow Technical Seminar

10 April 2008
Beneq's TFS 500 Atomic Layer Deposition (ALD) System receives award for best product in "New high-tech equipment development and high-end technology" contest.

8 April 2008
Beneq and Fives Stein join forces to provide high performance glass coatings solutions

6 March 2008
Beneq opens office in Shanghai

16 January 2008
Braggone and Beneq team up

08 January 2008
Beneq awarded 1st prize in Future Growth Company Company competition arranged by Helsingin Sanomat, the largest Finnish daily newspaper (in Finnish)

News 2007

News 2006

News 2005

26 February 2007: Beneq to build new fabrication reactor for high brightness blue LEDs and lasers

The Optoelectronics Group of Micro and Nanosciences Laboratory at Helsinki University of Technology (TKK) has initiated a three-year research project on gallium nitride wafer growth technology. Beneq Ltd will together with TKK develop a new reactor (HVPE), which will be based on a reactor optimised for ALD growth. This reactor type is currently in use at Micronova.

Thick substrate wafers grown in this project can be used to manufacture brighter LEDs.

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