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nCLEAR Thin Film Diffusion Barriers


Applications




nSILVER
nOPTO
nBIOCOMP
nCLEAR
nCOLOR
nCLEAN
Photovoltaics
 Surface Passivation of c-Si Solar Cells
 Cd-free Buffer Layer for CIGS
 TCO Coatings
 Other
Research Platform for ALD
Research Platform for nHALO

 


nCLEAR - the Ultimate Thin Film Diffusion Barriers



The need for very efficient moisture barrier films is a major challenge in plastics electronics, e.g. in OLED and PV applications.

Very best Water Vapour Transmission (WVTR) performance has recently been obtained for thin film coatings deposited by using Atomic Layer Deposition (ALD). Beneq has demonstrated world class WVTR results of 10 -4 g/m²/24 h at 80 °C, 80% RH, which corresponds to < 10 -6 g/m²/24h at ambient conditions. This is achieved with a nanolaminate (patent pending) deposited with ALD. An additional benefit of the ALD is an excellent conformal coating e.g. of 3D structures.

This nanolaminate ALD process can easily be scaled up in a cost effective batch setup suitable for high volume manufacturing. Beneq provides a turnkey solutions with the nCLEAR barrier coating systems
TFS 500, P400A/P800, and tailored solutions for customer production lines.

nCLEAR® brochure in PDF-format
nCLEAR® presentation in PDF-format


 

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