Applications

ALD Thin Film Research

Thin Film System TFS 500 ALD reactor is designed for various thin film processing purposes. Substrate alternatives include wafers and other planar substrates, powders and porous substrates as well as complex 3D substrates. TFS 500 can be equipped with a manual load lock for rapid wafer processing. Reactor operates in batch mode. Variable reaction chambers can be easily fitted inside the vacuum chamber making it possible to optimize the reaction chamber design according to the application.

Beneq ALD Research Platform in PDF-format