Technology

Atomic Layer Deposition

Atomic Layer Deposition has many unique features, which make it an attractive thin film preparation technique for many industrial applications. Traditionally, ALD has mainly been used in semiconductor and display industry, but its capability to produce pin-hole free and highly conformal thin film coatings even on complex shaped objects is often highly appreciated also by many other industries. The material selection is very wide, including numerous oxide and nitride materials as well as combinations and multi-layer structures of these materials. Modern high capacity ALD tools are capable of coating up to thousands of inch-scale objects in a single batch, offering annual coating capacity of millions of metal, glass and plastic products.

ALD technology presentation in PDF-format
ALD for research